1. Overview of Equipment and Application Fields

The CK450B magnetron sputtering coating system is a high-end multifunctional vacuum coating equipment, specifically designed for the preparation of nanoscale single-layer and multilayer functional films, rigid films, metal films, semiconductor films, and dielectric films. This system is widely used in film material research at universities and research institutes, as well as in the trial production of small-batch, high-precision samples. With its excellent temperature control performance and precise computerized control system, the CK450B can meet the high-quality film formation requirements under complex process conditions.

2. System Composition Architecture

The CK450B system is highly integrated with the following core modules:

· Vacuum chamber system: includes main sputtering chamber and the upper cover lifting mechanism.

· Target and power supply system: Equipped with 3 magnetron targets and corresponding high-voltage power supply.

· Sample stage system: A multifunctional sample stage supporting heating, rotation, and universal position conversion.

· Vacuum pumping and measurement system: molecular pump or cryopump with scroll dry pump system.

· Airway and control system: precision mass flow control and automatic computer control center.

· The thickness measuring system is a high precision quartz crystal oscillator monitor.

· Auxiliary systems: including water cooling, electronic control and safety interlock devices.

3. Core Functional Highlights

· The triple-target co-sputtering system features three standard permanent magnet magnetron targets with an effective sputtering area of 3 inches × 3 inches, employing an indirect water-cooling structure. Its unique straight-target upward sputtering design optimizes particle transport paths, enhancing both film formation efficiency and uniformity.

· The high-temperature programmable temperature control technology features a sample stage with robust heating capability, capable of reaching a maximum temperature of 600°C±1°C, and supports programmable temperature control. Users can preset complex heating, holding, and cooling curves to meet the specific process requirements of high-temperature annealing and in-situ film formation.

· The multidimensional motion sample stage (compatible with 3-inch × 3-inch, 3.2mm-thick planar samples) supports rotation (0-50 rpm) to ensure uniform film thickness, while its orbital function enables multi-position coating, significantly enhancing experimental flexibility.

· computer intelligent control system

o Real-time data acquisition: the real-time acquisition and error calculation of the sample displacement and the orbital speed with time.

o Visualization: Supports dual display modes for curves and numerical values, with orbital speed enabling free switching between linear and logarithmic scales for displacement curves.

o Precision coating: Achieves position-specific coating through precise control, meeting micro-area processing requirements.

· The substrate stage supports **-200V negative bias** output, which effectively improves film adhesion and density while removing surface impurities.

4. Technical Parameters and Specifications

5. Why choose CK450B?

The CK450B magnetron sputtering system distinguishes itself in scientific research equipment with its 600°C programmable temperature control and unique three-target upward sputtering design. Its advanced computerized control system not only automates and visualizes the process, but also ensures precise preparation of complex multilayer film structures through high-precision displacement and speed control. Whether for high-temperature superconducting film research or developing novel optical coatings, the CK450B stands as your trusted research partner.